Structural Studies of ZnO: Al Thin Film Synthesized by Low Cost Spray Pyrolysis for Optoelectronic Applications


Affiliations

  • Sathyabama University, Department of Physics, Chennai, Tamilnadu, 600 119, India
  • niversity of Madras, Department of Physics, Chennai, Tamilnadu, 600 005, India

Abstract

Undoped and Aluminum-doped ZnO thin films are prepared by ultrasonic spray pyrolysis at 400 °C on glass substrates were investigated. The dopant solution is taken at the atomic percentage of 1 to 5. By using X-Ray Diffraction (XRD) and Atomic Force Microscopy (AFM), the crystallographic properties and surface morphology of the films were characterized. The X-ray diffraction results show that the pure ZnO thin films have polycrystalline nature and possess a typical hexagonal wurtzite structure. Compared to pure ZnO thin film, the grain size in the Al-doped thin film is increased. They are well crystallized and the grain size is (e = 0.13 μm) for Al-doped ZnO and (e = 0.1 μm) for undoped ZnO. Compared to the previous reports, grain size of the ZnO thin film also increases with the increasing annealing temperature.

Keywords

Optoelectronic Devices, Spray Pyrolysis, Thin Film.

Subject Discipline

Chemistry

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